Tantalum Sputtering Target – Disc
Fa'amatalaga
Tantalum sputtering sini e masani lava ona faʻaaogaina i totonu o alamanuia semiconductor ma alamanuia faʻapipiʻi mata.Matou te gaosia faʻamatalaga eseese o tantalum sputtering sini i luga o le talosaga a tagata faʻatau mai pisinisi semiconductor ma alamanuia faʻapitoa e ala ile vacuum EB smelting method.E ala i le fa'aeteete i fa'agasologa ta'avale tulaga ese, e ala i togafitiga lavelave ma le sa'o o le vevela ma le taimi, matou te maua ai fua eseese o tantalum sputtering sini e pei o fa'ailoga tisiketi, fa'ailoga fa'afa'afa'afa ma fa'ailo fa'ata'amilo.E le gata i lea, matou te faʻamautinoa le mama tantalum i le va o le 99.95% i le 99.99% poʻo le maualuga;o le saito tele o loʻo i lalo ifo o le 100um, faʻamafola o loʻo i lalo ole 0.2mm ma le Faʻasao Faʻafanua o loʻo i lalo ole Ra.1.6μm.Ole tele e mafai ona faʻatulagaina e manaʻoga o tagata faʻatau.Matou te pulea lelei a matou oloa e ala i mea mataʻutia seʻia oʻo i le laina gaosiga atoa ma mulimuli ane tuʻuina atu i a matou tagata faʻatau ina ia mautinoa e te faʻatau a matou oloa i le mautu ma tutusa le lelei o fanua taʻitasi.
Matou te taumafai i le mea sili matou te mafaia e faʻafouina a matou metotia, faʻaleleia le tulaga lelei o oloa, faʻateleina le faʻaogaina o oloa, faʻaititia le tau, faʻaleleia la matou auaunaga e tuʻuina atu a matou tagata faʻatau oloa sili atu ona lelei ae faʻaititia tau faʻatau.O le taimi lava e te filifilia ai i matou, o le ae mauaina a matou oloa maualuga maualuga, sili atu le tau faʻatauvaʻa nai lo isi faʻatau oloa ma a matou auaunaga faʻapitoa, maualuga maualuga.
Matou te gaosia R05200, R05400 sini e fetaui ma le ASTM B708 ma e mafai ona matou faia sini e tusa ai ma au ata ua saunia.O le fa'aogaina o a matou tantalum ingots maualuga, meafaigaluega fa'apitoa, tekonolosi fou, 'au fa'apolofesa, matou te fa'aogaina au sini mana'omia.E mafai ona e taʻu mai ia i matou au manaʻoga uma ma matou faʻamaoni i le gaosiga i luga o ou manaʻoga.
Ituaiga ma le Tele:
ASTM B708 Standard Tantalum Sputtering Target , 99.95% 3N5 - 99.99% 4N Purity , Disc Target
Fua'iga vaila'au:
Iloiloga masani:Ta 99.95% 3N5 - 99.99%(4N)
Fa'ameamea leaga, ppm max i le mamafa
| Elemene | Al | Au | Ag | Bi | B | Ca | Cl | Cd | Co | Cr | Cu | Fe |
| Anotusi | 0.2 | 1.0 | 1.0 | 1.0 | 0.1 | 0.1 | 1.0 | 1.0 | 0.05 | 0.25 | 0.75 | 0.4 |
| Elemene | Ga | Ge | Hf | K | Li | Mg | Na | Mo | Mn | Nb | Ni | P |
| Anotusi | 1.0 | 1.0 | 1.0 | 0.05 | 0.1 | 0.1 | 0.1 | 5.0 | 0.1 | 75 | 0.25 | 1.0 |
| Elemene | Pb | S | Si | Sn | Th | Ti | V | W | Zn | Zr | Y | U |
| Anotusi | 1.0 | 0.2 | 0.2 | 0.1 | 0.0 | 1.0 | 0.2 | 70.0 | 1.0 | 0.2 | 1.0 | 0.005 |
O mea e le o ni u'amea, ppm max i le mamafa
| Elemene | N | H | O | C |
| Anotusi | 100 | 15 | 150 | 100 |
Paleni: Tantalum
Tele o Saito: Lapo'a masani<100μm Tele Saito
O isi saito tele e maua pe a talosagaina
Mafolafola: ≤0.2mm
Lau'ele'ele:<Ra 1.6μm
Laufanua: Faila
Talosaga
Mea faʻapipiʻi mo semiconductor, optics
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